Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe |
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| Authors: | T Yamane S Nakao Y Takeuchi H Muta R Ichiki K Uchino Y Kawai |
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| Institution: | 1. Solar Power Department, Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854‐0065, Japan;2. Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816‐8580, Japan;3. Department of Electrical and Electronic Engineering, Oita University, Oita, 870‐1192, Japan |
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| Abstract: | The parameters of a SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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| Keywords: | VHF plasma negative ions silicon thin film wall potential multi‐rod electrode |
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