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Effect of binary block‐selective solvents on self‐assembly of ABA triblock copolymer in dilute solution
Authors:Haizhou Yu  Jintao Zhu  Wei Jiang
Affiliation:1. State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China;2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, People's Republic of China
Abstract:We have studied the self‐assembly of the ABA triblock copolymer (P4VP‐b‐PS‐b‐P4VP) in dilute solution by using binary block‐selective solvents, that is, water and methanol. The triblock copolymer was first dissolved in dioxane to form a homogeneous solution. Subsequently, a given volume of selective solvent was added slowly to the solution to induce self‐assembly of the copolymer. It was found that the copolymer (P4VP43b‐PS366b‐P4VP43) tended to form spherical aggregate or bilayer structure when we used methanol or water as the single selective solvent, respectively. However, the aggregates with various nanostructures were obtained by using mixtures of water and methanol as the block‐selective solvents. The aggregate structure changed from sphere to rod, vesicle, and then to bilayer by changing water content in the block‐selective solvent from 0 to 100%. Moreover, it was found that the vesicle size could be well controlled by changing the copolymer content in the solution. © 2008 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 46: 1536–1545, 2008
Keywords:binary block selective solvent  micelles  self‐assembly  TEM  triblock copolymer
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