Synthesis of phosphorus‐carbide thin films by magnetron sputtering |
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Authors: | A Furlan G K Gueorguiev Zs Czigány H Högberg S Braun S Stafström L Hultman |
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Institution: | 1. Link?ping University – IFM, Thin Film Physics Division, 581 83 Link?ping, Sweden;2. Research Institute for Technical Physics and Materials Science, P.O. Box 49, Budapest 1525, Hungary |
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Abstract: | Phosphorus‐carbide, CPx (0.025 ≤ x ≤ 0.1), thin films have been synthesized by magnetron sputtering from pressed graphite–phosphorus targets. The films were characterized by X‐ray photoelectron spectroscopy, transmission electron microscopy and diffraction, and nanoindentation. CP0.1 ex‐hibits C–P bonding in an amorphous structure with elements of curved graphene planes, yielding a material with unique short range order. These features are consistent with what has been predicted by our results of theoretically modeled synthetic growth of CPx . The films are mechanically resilient with hardness up to 24 GPa and elastic recovery up to 72%. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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Keywords: | 68 37 Og 68 55 at 68 60 Bs 79 60 Dp 81 15 Cd |
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