Inter‐diffusion effects in as‐deposited Al/Ni polycrystalline multi‐layers |
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| Authors: | M Salou S Rioual J Ben Youssef D T Dekadjevi S P Pogossian P Jonnard K Le Guen G Gamblin B Rouvellou |
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| Institution: | 1. Laboratoire de Magnétisme de Bretagne, FRE/CNRS 3117, Université de Bretagne Occidentale, CS 93837, F‐29238 Brest Cedex 3, France;2. Laboratoire de Chimie‐Physique–Matière et Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614, F‐75231 Paris cedex 05, France |
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| Abstract: | Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated by Ni atoms. Moreover, the Ni diffusion results in the formation of an amorphous phase with a stoichiometry close to the Al3Ni aluminide. Copyright © 2008 John Wiley & Sons, Ltd. |
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| Keywords: | nickel aluminium multi‐layer structure inter‐diffusion XPS depth profile XES XRD |
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