Chemical Composition and Microstructure of Plasma-Nitrided Aluminium |
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Authors: | Harry Podlesak Uta Faust Bernhard Wielage Michael Quast Peter Mayr Heinz-Rolf Stock |
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Institution: | Technische Universit?t Chemnitz, Lehrstuhl Verbundwerkstoffe, 09107 Chemnitz, Germany, DE Stiftung Institut für Werkstofftechnik, Badgasteiner Stra?e 3, 28359 Bremen, Germany, DE
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Abstract: | Detailed examinations were made by AES depth profiling, SEM, TEM and electron diffraction to get information about the relation
between treatment conditions and the state of plasma-nitrided aluminium. The chemical composition and the elemental depth
distribution were proofed to be depending on gas phase mixture, pressure and temperature during plasma treatment. The admixture
of hydrogen during presputtering for surface cleaning and during nitriding results both in an improved nitriding behaviour
and in a reduction of the formation of conical-shaped particles at the surface. The microstructure of the nitride layer isn’t
depending on tested process conditions significantly. Surface and interface between layer and substrate are roughly in a scale
of a few ten nanometers owing to sputtering effects. The main phase inside the layer is nanocrystalline AlN of the known hexagonal
modification. In addition, some crystallites of remaining aluminium are present as a second phase. In contrast to nitrogen-implanted
aluminium no preferred lattice orientation of the AlN phase was evident. |
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Keywords: | : Aluminium plasma-assisted nitriding AlN AES TEM |
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