| V2O5在硅胶表面的分散及助剂K2SO4作用的研究 |
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| 引用本文： | 赵璧英,王秋霞,唐有祺.V2O5在硅胶表面的分散及助剂K2SO4作用的研究[J].物理化学学报,1993,9(2):187-192. |
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| 作者姓名： | 赵璧英 王秋霞 唐有祺 |
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| 作者单位： | Institute of Physical Chemistry, Peking University, Beijing 100871 |
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| 摘 要： | 用原位XRD方法证明V_2O_5能在硅胶表面自发分散, 但所需温度较高. 水汽对V_2O_5的分散有一定的阻碍作用. K_2SO_4可显著加快V_2O_5在SiO_2表面的分散速度, 并能降低V_2O_5/SiO_2的表面酸性. 被中和的主要是强酸位. 这可能是K_2SO_4能够改善V_2O_5/SiO_2催化剂在选择氧化反应中选择性的重要原因之一.
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| 关 键 词： | V2O5/SiO2催化剂 表面分散 K2SO4助剂 |
| 收稿时间： | 1991-11-11 |
| 修稿时间： | 1992-05-16 |
STUDY ON DISPERSION OF V_2O_5 ON SURFACE OF SiO_2 AND THE EFFECT OF PROMOTER K_2SO_4 |
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| Zhao Biying Wang Qiuxia Tang Youqi.STUDY ON DISPERSION OF V_2O_5 ON SURFACE OF SiO_2 AND THE EFFECT OF PROMOTER K_2SO_4[J].Acta Physico-Chimica Sinica,1993,9(2):187-192. |
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| Authors: | Zhao Biying Wang Qiuxia Tang Youqi |
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| Institution: | Institute of Physical Chemistry, Peking University, Beijing 100871 |
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| Abstract: | It has been shown by in situ XRD that V_2O_5 can disperse spontaneously ontothe surface of silica gel,but the dispersion temperature is relatively high.The presence of H_2O vapour inhibits the dispersion of V_2O_5 to a certain extent,Thedispersion process of V_2O_5 onto the surface of silica gel can be accelerated by usingK_2SO_4 as an additive.The surface acidity of V_2O_5/SiO_2 is quite strong.However,K_2SO_4 can suppress the acidity by neutralizing strong acid sites.This may be oneof the important reasons why K_2SO_4 can improve the selectivity of V_2O_5/SiO_2 formany selective oxidations. |
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| Keywords: | V_2O_5/SiO_2 catalyst Dispersion on surface K_2SO_4 promoter |
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