1, n-Triorganosilyl migrations in the rearrangements of silyl-substituted organolithium compounds |
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Authors: | John J. Eisch Miin-Rong Tsai |
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Affiliation: | Department of Chemistry, State of University of New York at Binghamton, Binghamtom, New York 13901 U.S.A. |
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Abstract: | Under the agency of the potent lithiating agent, n-butyllithium in TMEDA, an array of organosilanes was found to undergo 1, n-silyl rearrangements via carbanionic intermediates. Unambiguous 1, 2-, 1, 3- and 1, 4-silyl shifts were uncovered in 1-trimethylsilyl-1, 1, 2-triphenylethane, 1, 1-bis(trimethylsilyl)-1-phenylalkanes and 1, 2-bis(trimethylsilyl)-1, 2-diphenylethane, respectively. Cross-over and competition experiments established that these rearrangements generally are intramolecular and occur with decreasing ease in the order, 1, 2 > 1, 3 > 1, 4. In other compounds, such as 1, 1-bis(trimethylsilyl)-1, 2-diphenylethane, 1, n-bis(trimethylsilyl)benzenes and triphenyl(trimethylsilyl)methane, competing 1, n-silyl shifts occurred. Attack of the organolithium intermediates on solvent and silicon—lithium exchange were significant side reactions in some instances. 1-Trimethylgermyl-1, 1, 2-triphenylgermane underwent no discernible rearrangement but rather gave the product expected from germanium—lithium exchange. By conducting time and competition studies, it was shown that lithiation is the product-determining step in these rearrangements and that dual pathways, namely 1, 3-versus consecutive 1, 2- 1, 4-pathways, are operative in certain rearrangements. |
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