Separation of iron from semiconductor grade silicon in activation analysis |
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| Authors: | H. Jaskólska L. Waliś |
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| Affiliation: | (1) Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195 Warszawa, Poland |
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| Abstract: | A method of separation of iron from silicon for use in the neutron activation analysis has been developed. Iron was separated by extraction with N-benzoyl-N-phenylhydroxylamine /HBPHA/ from 0.4N HCl solution followed by extraction at pH=3.0. The lower limit of determination was 9.9×10–9 g. |
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