Reactive silica, XIV. Sorption and polymerization of ethylene oxide on reactive silica |
| |
| Authors: | N Sotani and M J D Low |
| |
| Institution: | (1) College of Liberal Arts, Kobe University, Tsurukabuto, 657 Nada, Kobe, Japan;(2) Department of Chemistry, New York University, 4 Washington Place, 10003 New York, NY, U.S.A. |
| |
| Abstract: | Ethylene oxide vapor was exposed to reactive silica (RS). It chemisorbed immediately on a pair of silicon radicals as –O–CH2–CH2–, and the adsorbed species polymerized. It is assumed that polymerization is not an ionic but a radical type reaction.
                       .    –O–CH2–CH2–    . , , .
Part XIII: Ref. 15 |
| |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ |
|
