Photoblock Copolymerization of Styrene with Acrylic Acid and Utilization for Reverse Osmosis Membrane

It was reported previously that carbon monoxide-styrene copolymer in benzene is photodegraded by irradiation from high pressure mercury lamp, and is block copolymerized in the presence of methyl methacrylate. In the present paper, by using macro-radical produced by photolysis with main chain scission of carbon monoxide-styrene copolymer, a styrene-acrylic acid block copolymer was prepared. The block copolymer could be utilized as a reverse osmosis membrane, if the thin layer was formed on a support membrane (Tyvek or Celgard).