Photopolymeritation of Methyl Methacrylate and Styrene by Sulfur Ylides

The photoinitiating ability of some sulfur ylides was studied. Diphenylsulfonium bis (methoxycarbony1)methylide (DPSY) could photoinitiate methyl methacrylate and styrene. A free radical mechanism was confirmed by a kinetic study, the inhibiting effect of benzoquinone, and the copolymer composition. From an analysis of the photodecomposition products it is suggested that the phenyl radical generated from the bond fission between the sulfur atom and the phenyl group participates in the initiation of this free radical polymerization. Methylphenylsulfonium bis (methoxycarbonyl) methylide, as well as DPSY, served as a photoinitiator, but dimethylsulfonium bis (methoxycarbony1)methylide did not. The differences are explained based on UV spectra.