Photodimerization of Thymine-Containing Polymers: Applicability to Reversible Photoresists |
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Authors: | K. Takemoto Y. Inaki |
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Affiliation: | Faculty of Engineering , Osaka University , Suita, Osaka, 565, Japan |
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Abstract: | The intramolecular photodimerization of thymine bases present on the side chain of a variety of synthetic oligomers and polymers was studied in detail in various organic solvents, and particularly in the case of thymine-containing polylysines, over a wide range of pH. Effects of solvents, presence of the complementary base, and spacers on the photoreaction were examined, and the conformational changes of the polymers were discussed in relation to their functionalities. Intermolecular photodimerization was further studied, and its applicability to photoresists was shown. |
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