首页 | 本学科首页   官方微博 | 高级检索  
     


Turning Spiroketals Inside Out: A Rearrangement Triggered by an Enol Ether Epoxidation
Authors:Chris Lorenc  Dr. Josep Saurí  Arvin Moser  Dr. Alexei V. Buevich  Dr. Antony J. Williams  Dr. R. Thomas Williamson  Dr. Gary E. Martin  Prof. Dr. Mark W. Peczuh
Affiliation:1. Department of Chemistry, University of Connecticut, 55 N. Eagleville Road, U3060, Storrs CT, 06269 USA;2. Process & Analytical Chemistry, NMR Structure Elucidation, Merck Research Laboratories, Rahway NJ, 07065 USA;3. Advanced Chemistry Development, Inc., 8 King Street E. Suite 107, Toronto ON, M5C 1B5 Canada;4. ChemConector, Inc., 904 Tamaras Circle, Wake Forest NC, 27587 USA
Abstract:Spiroketals organize small molecule structures into well-defined, three-dimensional configurations that make them good ligands of proteins. We recently discovered a tandem cycloisomerization–dimerization reaction of alkynyl hemiketals that delivered polycyclic, enol-ether-containing spiroketals. Here we describe rearrangements of those compounds, triggered by epoxidation of their enol ethers that completely remodel their structures, essentially turning them “inside out”. Due to the high level of substitution on the carbon skeletons of the substrates and products, characterization resorted to X-ray crystallography and advanced computation and NMR techniques to solve the structures of representative compounds. In particular, a new proton-detected ADEQUATE NMR experiment (1,1-HD-ADEQUATE) enabled the unequivocal assignment of the carbon skeleton of one of the new compounds. Solution of the structures of the representative compounds allowed for the assignment of product structures for the other compounds in two separate series. Both the rearrangement and the methods used for structural determination of the products are valuable tools for the preparation of characterization of new small molecule compounds.
Keywords:cheminformatics  computer-assisted structure elucidation  NMR spectroscopy  rearrangement  spiro compounds  spiroketals
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号