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Self-organized near-field etching of the sidewalls of glass corrugations |
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| Authors: | T. Yatsui K. Hirata Y. Tabata Y. Miyake Y. Akita M. Yoshimoto W. Nomura T. Kawazoe M. Naruse M. Ohtsu |
| Affiliation: | 1.School of Engineering,The University of Tokyo,Tokyo,Japan;2.Nanophotonics Research Center,The University of Tokyo,Tokyo,Japan;3.SIGMA KOKI Co., Ltd.,Tokyo,Japan;4.Department of Innovative and Engineered Materials,Tokyo Institute of Technology,Kanagawa,Japan;5.National Institute of Information and Communications Technology,Tokyo,Japan |
| Abstract: | Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface. |
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