On the Use of Global Kinetics Models for the Investigation of Energy Deposition and Chemistry in RF Argon–Oxygen Plasmas Working in the Torr Regime |
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Authors: | W. Morscheidt K. Hassouni N. Bauduin F. Arefi-Khonsari J. Amouroux |
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Affiliation: | (1) Laboratoire d'Ingénierie des Matériaux et des Hautes Pressions, CNRS-UPR 1311, Université Paris Nord, Av. J. B. Clément, 93430 Villetaneuse, France;(2) Université Pierre Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75005 Paris, France |
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Abstract: | A global plasma model is used to investigate the chemistry and energy deposition in 13.56 MHz radio-frequency capacitively coupled oxygen–argon discharges under conditions usually used for the deposition of tin oxide films. These models are based on the solution of a stationary electron Boltzmann equation coupled to species balance equations including the vibrational kinetics equations of O2. The results obtained showed that vibrational non equilibrium of O2-molecule is not significant. The dissociation degree of O2 was found to be around a few percents and the discharge was often moderately electronegative even for small O2 contents in the feed gas. The ionization and energy dissipation mechanisms are mainly governed by the collisional processes involving O2 for an oxygen feed gas composition greater than 20%. Results also showed that the predicted densities of the charged species and the electronegative character of the discharge are strongly linked to the assumption made on the homogeneity of the power deposition. On the contrary, the predicted density of O-atom is not sensitive to this assumption. |
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Keywords: | RF discharge low pressure argon– oxygen plasmas global plasma model |
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