Digitally alloyed modulated precursor flow epitaxial growth of AlxGa1−xN layers with AlN and AlyGa1−yN monolayers |
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Authors: | Suk Choi Hee Jin KimJae-Hyun Ryou Russell D Dupuis |
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Institution: | Center for Compound Semiconductors and School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Dr. NW, Atlanta, Georgia 30332-0250, USA |
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Abstract: | We propose a new growth scheme of digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG) using metalorganic and hydride precursors for the growth of AlxGa1−xN layers with high-Al content at relatively low temperatures. The growth of high-quality, high-Al content AlxGa1−xN layers (xAl>50%) that are composed of AlN and AlyGa1−yN monolayers on AlN/sapphire template/substrates by DA-MPEG was demonstrated. The overall composition of the ternary AlxGa1−xN material by DA-MPEG can be controlled continuously by adjusting the Column III mole fraction of the atomic AlyGa1−yN sub-layer. X-ray diffraction and optical transmittance results show that the AlGaN materials have good crystalline quality. The surface morphology of DA-MPEG AlGaN samples measured by atomic force microscopy are comparable to high-temperature-grown AlGaN and are free from surface features such as nano-pits. |
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Keywords: | 81 15 Gh |
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