| 激光烧蚀溅射沉积薄膜的研究现状 |
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| 引用本文： | 宋光乐. 激光烧蚀溅射沉积薄膜的研究现状[J]. 原子与分子物理学报, 2002, 19(1): 115-118 |
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| 作者姓名： | 宋光乐 |
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| 作者单位： | 山东临沂师范学院物理系,276005 |
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| 摘 要： | 激光烧蚀溅射沉积薄膜技术是一项新的固体薄膜制造技术.文内简单地介绍了这项技术产生的历史背景、进化过程;根据相关文献,详细描述了这项技术的原理;基于最新资料,全面讨论了这项技术的国内外研究现状;总结了该技术的优、缺点;客观评价了该技术的应用前景和研究意义;并对该技术的今后研究方向提出了建议.
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| 关 键 词： | 激光烧蚀 溅射沉积 光谱分析 等离子体辐射 固体薄膜 |
| 文章编号： | 1000-0364(2002)01-0115-04 |
| 收稿时间： | 2001-11-05 |
| 修稿时间： | 2001-11-05 |
Thin solid films deposited by pulsed laser ablating spray |
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| SONG Guang-le. Thin solid films deposited by pulsed laser ablating spray[J]. Journal of Atomic and Molecular Physics, 2002, 19(1): 115-118 |
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| Authors: | SONG Guang-le |
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| Abstract: | The fabricating technique of thin solid films deposited by pulsed laser ablating spray is a new technique. the background from which it came into being and the process of its evolution were briefly described. According to relative documents, basic principle of the technique was dwelt on. Based on the latest documents, the status quo, including the studying abroand and home, was discussed in detail. The advantages, shortcomings, prospect of its utility, the significance of studying as well as critic problems were summarized. Some proposal was suggested. |
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| Keywords: | Laser ablation Spraying deposition Spectra analysis Plasma radiation Thin solid film |
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