ZnO:Fe薄膜制备、光学与电学性质研究

用双靶磁控溅射设备制备了ZnO:Fe薄膜。分析了铁靶溅射功率对薄膜的光学及电学性质的影响。X射线衍射(XRD)和原子力显微镜(AFM)图像表明:ZnO:Fe薄膜为六角纤锌矿结构,且具有非常好的沿垂直于衬底的c轴择优取向。当铁靶功率小于250W时,沉积速率随铁靶功率的增加而增加。随着铁靶功率的增加,透射光谱的吸收边有微弱蓝移,透过率在可见光区超过75%。掺铁后薄膜的电阻率只有10-2Ω.cm,远小于纯氧化锌的电阻率。通过实验得到ZnO:Fe薄膜的最佳制备条件。

The Growth and Study of the Optical and Electrical Properties of the ZnO:Fe Thin Films

ZnO:Fe films were prepared by double target magnetron sputtering,the influences of the Fe target on the optical and electrical properties of the ZnO:Fe thin films were analyzed.The results of X-ray diffraction(XRD) and atomic force microscopy(AFM) indicate that ZnO:Fe thin films are hexagonal wurtzite structure and have a preferred orientation with the c axis,which is perpendicular to the substrate.The deposition rate increases with Fe target power when lower than 250 W powers of them were applied.With the increasing of the Fe target power,the transparent of the coatings showed low blue shifts with the transmittance within the visible range being up to 75%.The resistivity of the ZnO:Fe thin films is only a value of 10-2Ω.cm,it is smaller than that of the pure ZnO.We get the best condition for ZnO:Fe thin films by experimenting.