Reactivity of monolayer V2O5 films on TiO2(1 1 0) produced via the oxidation of vapor-deposited vanadium |
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| Authors: | G.S. WongM.R. Concepcion J.M. Vohs |
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| Affiliation: | Department of Chemical and Biomolecular Engineering, University of Pennsylvania, 200 S. 33rd Street, Philadelphia, PA 19104-6393, USA |
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| Abstract: | The growth, and reactivity of monolayer V2O5 films supported on TiO2(1 1 0) produced via the oxidation of vapor-deposited vanadium were studied using X-ray photoelectron spectroscopy and temperature programmed desorption (TPD). Oxidation of vapor-deposited vanadium in 10−7 Torr of O2 at 600 K produced vanadia films that contained primarily V3+, while oxidation in 10−3 Torr at 400 K produced films that contained primarily V5+. The reactivity of the supported vanadia layers for the oxidation of methanol to formaldehyde was studied using TPD. The activity for this reaction was found to be a function of the oxidation state of the vanadium cations in the film. |
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| Keywords: | Vanadium oxide Titanium oxide Oxidation Vanadium X-ray photoelectron spectroscopy Thermal desorption spectroscopy |
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