Reactivity of monolayer V2O5 films on TiO2(1 1 0) produced via the oxidation of vapor-deposited vanadium |
| |
| Authors: | GS WongMR Concepcion JM Vohs |
| |
| Institution: | Department of Chemical and Biomolecular Engineering, University of Pennsylvania, 200 S. 33rd Street, Philadelphia, PA 19104-6393, USA |
| |
| Abstract: | The growth, and reactivity of monolayer V2O5 films supported on TiO2(1 1 0) produced via the oxidation of vapor-deposited vanadium were studied using X-ray photoelectron spectroscopy and temperature programmed desorption (TPD). Oxidation of vapor-deposited vanadium in 10−7 Torr of O2 at 600 K produced vanadia films that contained primarily V3+, while oxidation in 10−3 Torr at 400 K produced films that contained primarily V5+. The reactivity of the supported vanadia layers for the oxidation of methanol to formaldehyde was studied using TPD. The activity for this reaction was found to be a function of the oxidation state of the vanadium cations in the film. |
| |
| Keywords: | Vanadium oxide Titanium oxide Oxidation Vanadium X-ray photoelectron spectroscopy Thermal desorption spectroscopy |
| 本文献已被 ScienceDirect 等数据库收录！ |
