Channel length effect in a MOSFET structure by scanning capacitance microscopy |
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Authors: | CJ Kang D JeonY Kuk |
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Institution: | a Department of Physics, Myongji University, San38-2, Namdong, Yongin, Kyunggido 449-728, South Korea b National Creative Research Initiative Center for Sciences in Nanometer Scale, Department of Physics, Seoul National University, Seoul 151-742, South Korea |
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Abstract: | Depth dependent carrier density and trapped charges in a metal-oxide-semiconductor field effect transistor (MOSFET) like structure have been studied using scanning capacitance microscopy (SCM). For a MOSFET structure, since minority carrier can be provided by the source and drain diffusions, its response time is shorter than that of metal-oxide-semiconductor (MOS) system. So the high frequency C-V relation is slightly different from that of MOS capacitor and shows the characteristics dependent on the channel length. Bias dependent SCM images which represent the depth dependent carrier density and detrapping time constant of trapped charges in the oxide layer were observed to see the channel effect in a MOSFET structure. |
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Keywords: | Surface electronic phenomena (work function surface potential surface states etc ) Metal-oxide-semiconductor (MOS) structures Silicon Silicon oxides |
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