| 电化学方法制备铜钴纳米多层膜 |
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| 引用本文： | 薛江云,吴继勋,杨德钧.电化学方法制备铜钴纳米多层膜[J].电化学,1996,2(3):274. |
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| 作者姓名： | 薛江云 吴继勋 杨德钧 |
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| 作者单位： | 北京科技大学表面科学与腐蚀工程系 |
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| 基金项目： | 冶金部腐蚀与磨损开放实验室资助 |
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| 摘 要： | 采用旋转圆盘电极、双脉冲电位法从单一的含有铜离子和钴离子的镀液中电沉积Ｃｕ－Ｃｏ纳米多层膜、并用ＴＥＭ．ＡＥＳ和Ｘ－射线衍射研究镀层的形貌和组成。结果表明：多层膜结构为纯铜和含有少量铜的铜钴合金层交替组成，铜在钴层中的含量，随镀液中的铜含量的增大和转速的提高而提高。
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| 关 键 词： | 电沉积 铜钴合金 纳米 多层膜 |
| 收稿时间： | 1996-08-28 |
Electrodeposition of Cu-Co Multilayer Thin Films |
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| Xue Jiangyun,Wu Jixun,Yang Dejun.Electrodeposition of Cu-Co Multilayer Thin Films[J].Electrochemistry,1996,2(3):274. |
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| Authors: | Xue Jiangyun Wu Jixun Yang Dejun |
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| Abstract: | A method has been developed to produce Cu-Co Multilayer from a single electrolyte by electredeposition. The effects of the concentration of copper ions,current density and the speed of rotation were investigated,and the Cu-Co electrodeposition films were analysed by TEM. AES and X-ray diffraction.The results indicated that the film was alternating pure copper and coppercobalt alloy layers. If the content of copper in cobalt layer is to be small,the concentration of its ions in solution must be small and the rotation speed must be low. |
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| Keywords: | Electro-deposition Copper-Cobalt alloy Multilayer |
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