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HG-AFS测定高纯碲中痕量硒干扰的消除
引用本文:马名扬,苏流坤.HG-AFS测定高纯碲中痕量硒干扰的消除[J].光谱学与光谱分析,2011,31(11):3123-3125.
作者姓名:马名扬  苏流坤
作者单位:中国广州分析测试中心, 广东省分析测试技术公共实验室,广东 广州 510070
基金项目:国家自然科学基金项目(20807012); 广东省自然科学基金项目(9151065003000010)资助
摘    要:用HNO3+HCl分解样品,采用Fe3+-柠檬酸混合溶液作抑制剂,研究了下氢化物发生-原子荧光光谱法测定痕量硒时的干扰及其机理,探讨了NO-3和NO-2残留的影响,并用正交试验设计结合单因素试验研究了不同浓度Fe3+盐、盐酸、柠檬酸、硼氢化钾等条件下Se的回收率。该方法的检出限为0.15 μg·L-1,样品中Se含量为27.01 μg·L-1的相对标准偏差在3.1%~4.2%之间(n=11),加标回收率为96.1%~102.3%。用于实际样品的测定,结果满意。

关 键 词:高纯碲    干扰及消除  原子荧光光谱  
收稿时间:2010-09-04

Elimination of Interference in the Determination of Selenium in High Purity Tellurium by HG-AFS
MA Ming-yang,SU Liu-kun.Elimination of Interference in the Determination of Selenium in High Purity Tellurium by HG-AFS[J].Spectroscopy and Spectral Analysis,2011,31(11):3123-3125.
Authors:MA Ming-yang  SU Liu-kun
Institution:Guangdong Provincial Public Laboratory of Analysis and Testing Techdogy,China National Analytical Center, Guangzhou,Guangzhou 510070,China
Abstract:The samples were decomposed with HNO3+HCl,and Fe3+-citric acid mix solution was added to eliminate interferences.The elimination and mechanism of tellurium interference with selenium determination by HG-AFS were studied,and the residuary influence of NO-3 and NO-2 was investigated.The interference of ferric trichloride,hydrochloric acid,citric acid and PBH concentration with the fluorescence intensity of selenium was observed by the orthogonal test design combined with the mono-factor test.The detection lim...
Keywords:High purity tellurium  Selenium  Interference and elimination  Atomic fluorescence spectrometry  
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