Digital shifting photoelasticity with optical enlarged unwrapping technology for local stress measurement |
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Authors: | Xue-Feng Yao Long-Hui Jian Wei Xu Guan-Chang Jin Hsien-Yang Yeh |
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Institution: | aDepartment of Engineering Mechanics, Tsinghua University, Beijing 100084, China;bDepartment of Mechanical and Aerospace Engineering, California State University, Long Beach, CA 90840-8305, USA |
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Abstract: | In this paper, photoelasticity combined with phase shifting technology is used to obtain stress distribution within the stress concentration zone. Both the optical enlarged unwrapping technology and the combined path shear difference technology are provided for evaluating the local stress information. By means of a phase shifting photoelastic experiment of a diametric-compressed disc, the stress components surrounding the local loading zone are determined. The results show not only a good improvement compared with conventional photoelastic analysis but also a good agreement with theoretical data. |
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Keywords: | Optical enlarged unwrapping technology Phase shifting photoelasticity Combined path shear stress difference Local stress |
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