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Digital shifting photoelasticity with optical enlarged unwrapping technology for local stress measurement
Authors:Xue-Feng Yao  Long-Hui Jian  Wei Xu  Guan-Chang Jin  Hsien-Yang Yeh
Institution:aDepartment of Engineering Mechanics, Tsinghua University, Beijing 100084, China;bDepartment of Mechanical and Aerospace Engineering, California State University, Long Beach, CA 90840-8305, USA
Abstract:In this paper, photoelasticity combined with phase shifting technology is used to obtain stress distribution within the stress concentration zone. Both the optical enlarged unwrapping technology and the combined path shear difference technology are provided for evaluating the local stress information. By means of a phase shifting photoelastic experiment of a diametric-compressed disc, the stress components surrounding the local loading zone are determined. The results show not only a good improvement compared with conventional photoelastic analysis but also a good agreement with theoretical data.
Keywords:Optical enlarged unwrapping technology  Phase shifting photoelasticity  Combined path shear stress difference  Local stress
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