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Investigation of the peculiarities of Ge island growth on Si (100) under MBE conditions
Authors:V. A. Lapin  B. M. Sinel’nikov  M. D. Bavizhev  I. A. Sysoev  D. S. Kuleshov  F. F. Malyavin
Affiliation:1. North Caucasus State Technical University, Stavropol, Russia
Abstract:The results of investigating the features of Ge-island formation on Si (100) under conditions of molecular-beam epitaxy is presented. Nanosized structures at heteroboundaries (islets and quantum dots) are attracting great interest due to new useful properties and broad prospects of their application.
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