Photoinitiated Polymerization‐Induced Self‐Assembly of Glycidyl Methacrylate for the Synthesis of Epoxy‐Functionalized Block Copolymer Nano‐Objects

Herein, a novel photoinitiated polymerization‐induced self‐assembly formulation via photoinitiated reversible addition–fragmentation chain transfer dispersion polymerization of glycidyl methacrylate (PGMA) in ethanol–water at room temperature is reported. It is demonstrated that conducting polymerization‐induced self‐assembly (PISA) at low temperatures is crucial for obtaining colloidal stable PGMA‐based diblock copolymer nano‐objects. Good control is maintained during the photo‐PISA process with a high rate of polymerization. The polymerization can be switched between “ON” and “OFF” in response to visible light. A phase diagram is constructed by varying monomer concentration and degree of polymerization. The PGMA‐based diblock copolymer nano‐objects can be further cross‐linked by using a bifunctional primary amine reagent. Finally, silver nanoparticles are loaded within cross‐linked vesicles via in situ reduction, exhibiting good catalytic properties.