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Photosensitive Polyarylates Based on Reaction Development Patterning
Authors:Toshiyuki Oyama  Akira Kitamura  Takafumi Fukushima  Takao Iijima  Masao Tomoi
Abstract:Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin‐coating onto copper foil, which showed positive‐tone behavior after UV irradiation and development with an ethanolamine/N‐methylpyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9–14 μm film thickness. The pattern‐forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern‐forming reaction occurs during development.
Keywords:diazonaphthoquinone  photoresists  polyarylates  polyesters  reaction development patterning (RDP)
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