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Surface segregation of aluminum atoms on Cu-9 at.% Al(1 1 1) studied by Auger electron spectroscopy and low energy electron diffraction
Authors:Yinghui Yu  Keisuke Sagisaka  Daisuke Fujita
Affiliation:Advanced Nano Characterization Center, National Institute for Materials Science, 1-2-1 Sengen Tsukuba, Ibaraki 305-0047, Japan International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-2-1 Sengen Tsukuba, Ibaraki 305-0047, Japan
Abstract:Auger electron spectroscopy (AES) and low energy electron diffraction (LEED) were applied to investigate the segregation of aluminum atoms on a Cu-9 at.% Al(1 1 1) surface. We observed that the Al concentration in the top layer ranged between about 9 and 36 at.% after the sample we used was annealed at different temperatures. The phenomenon of Al atoms segregating on the surfaces was explained well by considering the diffusion length of Al atoms in bulk Cu. LEED measurements showed that View the MathML sourceR30° structures grew as the concentration of Al atoms increased. The segregation phenomena on surfaces resulted in a stable two-dimensional Cu67Al33 alloy phase in the top layer.
Keywords:Auger electron spectroscopy   Low energy electron diffraction   Concentration   Annealing temperature
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