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Photochemical generation and trapping of radicals from bisphenyl carbodiazone |
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| Authors: | Markus R. Heinrich Marcel D. Kirschstein |
| Affiliation: | Lehrstuhl für Organische Chemie 1, Technische Universität München, Lichtenbergstr. 4, D-85747 München, Germany |
| Abstract: | UV irradiation at 350 nm of bisphenyl carbodiazone creates nitrogen, phenyl and (phenyldiazenyl)carbonyl radicals under mild conditions. The radicals formed were trapped by olefins and tetramethylpiperidinoxyl radicals. |
| Keywords: | Bisphenyl carbodiazone Phenyl radicals (Phenyldiazenyl)carbonyl radicals Carbooxygenation |
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