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Tetrachlorosilane Consumption in Radio Frequency Glow Discharge
Authors:Blinov  L. M.  Golovkin  A. G.  Kaganov  L. I.  Oparin  V. B.  Razhavski  A. A.  Shterenberg  A. M.  Volodko  V. V.  Zyn  V. I.
Affiliation:(1) Department of General and Laser Physics, Technical University of Samara, 141 Galaktionovskaya St., Samara, 443010, Russia
Abstract:Time-resolved mass spectrometry was used for analysis of the plasma reactions in radio frequency (RF) SiCl4and SiCl4–O2discharges as functions of starting partial pressure and electrical power. Molecular concentrations of the reactants and products from SiCl4alone and with O2were obtained from the mass spectra and used for plotting the kinetic curves. The SiCl4and O2consumption rates were calculated from the kinetic curves and compared with results of theoretical simulation of the reaction. Direct electron impact decomposition was found to be the main pathway for pure SiCl4conversion. On the contrary, the consumption of SiCl4in the SiCl4+O2mixtures was largely chemical. The experimental macrokinetics are in agreement with a model in which oxidation is caused by the atomic oxygen.
Keywords:RF SiCl4 discharge  mass spectrometry  kinetics  decomposition  oxidation
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