Photoelectrochemical characteristics of oxide layers on copper-nickel alloys |
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| Authors: | A N Kamkin Guo-Ding Zhou A D Davydov |
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| Institution: | (1) Moscow State University, Vorob'evy Gory, Moscow 119899, Russia, RU;(2) Shanghai Institute of Electric Power, Shanghai 200090, China, CN;(3) Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Leninskii pr. 31, Moscow 117071, Russia, RU |
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| Abstract: | The electrochemical behavior of a series of Cu-(7, 30, 50, 70 wt%)Ni alloys in borate buffer and sodium sulfate solutions
with and without argon purging was studied by cyclic voltammetry and the photocurrent response method. It is shown that nickel
has an effect on both the dark and photocurrents and stimulates oxide film formation. The measurements show that oxygen leads
to the formation of passivating p-type Cu2O layers. In sulfate solution this type changes at the potential of the onset of intense alloy dissolution.
Received: 15 June 1998 / Accepted: 16 November 1998 |
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