| 强流氧离子注入机注入均匀性分析及提高 |
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| 引用本文： | 刘咸成,贾京英,唐景庭.强流氧离子注入机注入均匀性分析及提高[J].电子工业专用设备,2005,34(4):48-52,59. |
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| 作者姓名： | 刘咸成 贾京英 唐景庭 |
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| 作者单位： | 中国电子科技集团第四十八研究所,湖南,长沙,410111;中国电子科技集团第四十八研究所,湖南,长沙,410111;中国电子科技集团第四十八研究所,湖南,长沙,410111 |
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| 摘 要： | 对强流氧离子注入机的注入靶室进行分析探讨,对影响均匀性指标的靶盘结构、束的形状和束扫描注入方式进行研究,结合主体硬件,增加晶片自旋装置和采用新的扫描方式,来提高注入均匀性指标。
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| 关 键 词： | 注入机 离子束 均匀性 变速扫描 SOI |
| 文章编号： | 1004-4507(2005)04-0048-05 |
Uniformity Analysis and Enhancement for Implantation of High-current Oxygen Implanter |
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| LIU Xian-cheng,JIA Jing-ying,TANG Jing-ting.Uniformity Analysis and Enhancement for Implantation of High-current Oxygen Implanter[J].Equipment for Electronic Products Marufacturing,2005,34(4):48-52,59. |
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| Authors: | LIU Xian-cheng JIA Jing-ying TANG Jing-ting |
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| Abstract: | Implantation target of high-current oxygen ion implanter is analyzed in this article. Indexes which shall effect uniformity such as target panel structure, beam form and beam scan implantation method are also studied. Main frame hardware, adding wafer auto-circle device and new scan method are complexly employed to improve implantation uniformity. |
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| Keywords: | Implanter Ion beam Uniformity Variable velocity scan SOI |
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