首页 | 本学科首页   官方微博 | 高级检索  
     检索      


B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm
Authors:Zhanshan Wang  Shumin Zhang  Wenjuan Wu  Jingtao Zhu  Hongchang Wang  Cunxia Li  Yao Xu  Fengli Wang  Zhong Zhang  Lingyan Chen  Hongjun Zhou  Tonglin Huo
Abstract:The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱ radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
Keywords:
本文献已被 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号