Optimization of EUV radiation yield from laser-produced plasma

We optimize the conversion of laser energy into extreme ultraviolet (EUV) radiation by tailoring the laser parameters for a laser-produced plasma generated from 20 μm diameter water droplets. It is shown that mass-limited targets require careful adaption of laser-pulse energy and laser-pulse duration separately, rather than laser intensity, which seems to be adequate for bulk targets. The optimal pulse duration scales with the droplet radius, and the optimal pulse energy with the droplet volume. With optimized parameters, we obtain a conversion efficiency of 0.23% in 4π and 2.5% bandwidth for 13 nm radiation, the future EUV lithography light. Received: 16 July 2001 / Revised version: 25 September 2001 / Published online: 7 November 2001