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Effect of Asi on the optical properties of Ga1−xInxAs/InP grown by molecular beam epitaxy
Authors:J M Schneider  M Popp  M Hurich  M Schiefele  M Wachter  B Marheineke and H Heinecke
Institution:

a Department of Semiconductor Physics, University of Ulm, Albert-Einstein-Allee 45 D-89069 Ulm Germany

Abstract:This report focuses on the effect of the As species and the V/III ratio on the optical properties of Ga1−xInxAs/InP grown by molecular beam epitaxy (MBE). The band gap energies of the layers were measured by low temperature photoluminescence (PL) while the indium contents x were determined by X-ray for samples in the investigated range of 0.50<x<0.56. For the analysis of these data we considered the model of Kuo et al. which we confined with a correction for the different measurement temperatures in PL (4.2 K) and X-ray (300 K). Using As4 with an effective V/III ratio higher than 1.3, we find the best agreement of the band gap energies and predictions of the theory. A lower V/III ratio always implies a reduction of the band gap energy to values 5-15 meV lower than expected. In contrast, using As2 the PL data fit quite well independent of the effective V/III ratio above unity.
Keywords:
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