Adsorption of silanes bearing nitrogenated Lewis bases on SiO2/Si (100) model surfaces |
| |
Authors: | Andresa Juliana Salvador Reis Rafael Machado Gonzalez Eduardo Perez Santos Leonardo Silva Eberlin Marcos Nogueira de Paula Nascente Pedro Augusto Tanimoto Sonia Tomie Machado Sérgio Antônio Spínola Rodrigues-Filho Ubirajara P |
| |
Affiliation: | Universidade de S?o Paulo, Instituto de Química de S?o Carlos, P.O. Box 780, 13564-970 S?o Carlos, Brazil. |
| |
Abstract: | The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolylpropyltrimethoxysilane (3-IPTS) and 4-(N-propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as transition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-silicon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with "on-spot" MALDI-TOF MS detection. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|