| 摘 要： | The impurities in two kinds of HfO_2 materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum technology and secondary ion mass spectrometry(SIMS) equipment respectively.It was found that ZrO_2 was the main impurity in the two kinds of HfO_2 either in the original HfO_2 materials or in the electron beam deposited films.In addition,the difference of Zr content in the two kinds of HfO_2 single layer films was much larger than that of the other impurities such as Ti and Fe,which showed that it was just ZrO_2 that made the difference between the optical performance of the film products including the two kinds of HfO_2.With these two kinds of HfO_2 and the same kind of SiO_2,we deposited HfO_2/SiO_2 multilayer reflective coatings at the wavelength of 266 nm.Experimental results showed that the reflectances of these two mirrors were about 99.85% and 99.15% respectively, which agreed well with the designed results what were based on the optical constants obtained from the corresponding single layer thin films.
|
