氨水-六甲基二硅胺烷对SiO2化学膜环境稳定性的影响

针对溶胶-凝胶技术制的单层SiO₂化学膜，在室温下研究氨水-六甲基二硅胺烷（HMDS）气氛的量对膜层改性的影响，并在低真空条件下测试了其抗邻苯二甲酸二丁酯（DBP）污染性能。采用紫外-可见-近红外分光光度计（UV-Vis-NIR）、红外光谱仪和原子力显微镜分析了改性前后化学膜特性的演变。研究结果表明:经过DBP污染后，15～30 mL氨水-HMDS改性后化学膜的峰值透过率为99.8%，较改性前化学膜的峰值透过率提升了3.5%，此时化学膜表现出优异的抗污染特性。但是，随着氨水-HMDS处理量的进一步增多，化学膜的激光损伤阈值由改性前的的24.32 J/cm2降到19.36 J/cm2。本研究有助于优化改性参数，以提高化学膜的抗污染性能，在实际工程应用中具有重要的价值。

Influence of ammonia-hexamethyldisilazane on environmental stability of SiO2 chemical film

The single-layer SiO₂ chemical films prepared by sol-gel technology were modified with different amounts of ammonia-hexamethyldisilazane (HMDS) atmosphere at room temperature, and then the anti-pollution porformance of the chemical films for dibutyl phthalate (DBP) contamination were tested under low vacuum condition. In addition, the ultraviolet-visible-near-infrared spectrophotometer UV-Vis-NIR), infrared spectrometer and atomic force microscope were used to analyze the evolution of chemical film characteristics before and after modification. The results show that after DBP contamination, the peak transmittance of the chemical film modified by 15?30 mL ammonia-HMDS is 99.8%, which is increased by 3.5% compared with that of the chemical film before modification. At this time, the chemical films have excellent anti-pollution properties. Although the ammonia-HMDS treatment can significantly enhance the anti-pollution performance of DBP contamination of the chemical film, excessive amount of ammonia-HMDS will lead to the laser damage threshold of the chemical film to decrease from 24.3 J/cm2 to 19.3 J/cm2. The research is helpful to optimize the process parameters to improve the anti-pollution performance of the chemical film, which has great significance for practical engineering applications.