Establishing the difference between colloidal borosilicate and boron-modified colloidal silica via chelation of boron with catechol and dl-tartaric acid

Colloidal borosilicate and boron-modified colloidal silica sols were studied by ¹¹B NMR. Formation of B–O–Si chemical bonds is established in both materials. It is shown that boron present in colloidal borosilicate is stable towards the action of complexing agents catechol and tartaric acid. In contrast, the boron in boron-modified silica is readily complexed by these agents. The results presented herein demonstrate that B–O–Si bonds are homogeneously distributed throughout the colloidal borosilicate disperse phase, while in boron-modified colloidal silica they are concentrated at the surface of colloidal silica particles.