Single- and multi-scan femtosecond laser writing for selective chemical etching of cross section patternable glass micro-channels |
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Authors: | Email author" target="_blank">Stephen?HoEmail author Peter?R?Herman J?Stewart?Aitchison |
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Institution: | (1) The Edward S. Rogers Sr. Department of Electrical and Computer Engineering and the Institute for Optical Sciences, University of Toronto, 10 King’s College Road, Toronto, M5S 3G4, Ontario, Canada |
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Abstract: | We report on the fabrication of three dimensional micro-fluidic channels in fused silica glass using a combination of femtosecond
laser writing and hydrofluoric acid wet etching to flexibly create various cross-sectional profiles of highly uniform shape
and smooth vertical walls. The laser power, polarization, focusing depth, scanning angle and scanning speed were systematically
studied with single- and multi-scan configurations to assess optimum micro-channel formation including etch rate, surface
roughness, and stress-induced crack formation. We introduce the formation of vertical access-ports that extend the buried
channel formation to unlimited length without tapering or distortion of the channel cross-sectional shape. |
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Keywords: | |
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