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Single- and multi-scan femtosecond laser writing for selective chemical etching of cross section patternable glass micro-channels
Authors:Email author" target="_blank">Stephen?HoEmail author  Peter?R?Herman  J?Stewart?Aitchison
Institution:(1) The Edward S. Rogers Sr. Department of Electrical and Computer Engineering and the Institute for Optical Sciences, University of Toronto, 10 King’s College Road, Toronto, M5S 3G4, Ontario, Canada
Abstract:We report on the fabrication of three dimensional micro-fluidic channels in fused silica glass using a combination of femtosecond laser writing and hydrofluoric acid wet etching to flexibly create various cross-sectional profiles of highly uniform shape and smooth vertical walls. The laser power, polarization, focusing depth, scanning angle and scanning speed were systematically studied with single- and multi-scan configurations to assess optimum micro-channel formation including etch rate, surface roughness, and stress-induced crack formation. We introduce the formation of vertical access-ports that extend the buried channel formation to unlimited length without tapering or distortion of the channel cross-sectional shape.
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