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Time dependent argon glow discharge treatment of Al-alloy samples
Authors:Sunanda J Karandikar  S V Gogawale  A K Dua  K K Kutty
Affiliation:(1) Department of Physics, University of Mumbai, Vidyanagari, 400 098 Mumbai, India;(2) Chemistry Division, Bhabha Atomic Research Centre, 400 085 Mumbai, India
Abstract:Aluminium alloy ultra-high vaccum system provides a convenient tool to access the UHV region due to short pump down time, its reduced weight, low cost etc. For UHV systems, aluminium and its alloys are preferred materials to stainless steel. A cylincrical discharge chamber of SS 304 with various ports on it, evacuated by turbomolecular pumping unit is used in the experimental system. A hollow cathode de glow discharge in argon for different time durations is used to treat chemically cleaned ASA 6063 aluminium alloy samples, keeping all other parameters constant. The scanning electron microscope (SEM) is used to examine processed surfaces and to study topographical features. The energy dispersive microanalysis by X-rays (EDX) is used to determine the elemental composition of the samples. The results indicate the physical sputtering taking place in Ar GDC. The etched area increases with discharge time duration. The EDX spectrum shows the inconsistency in weight percentage of various elements of Al-alloy.
Keywords:Aluminium alloy  scanning electron microscope  energy dispersive microanalysis by X-rays  argon glow discharge  time-dependent
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