首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Spectrographic determination of ultramicro amounts of boron in high-purity silicon tetrachloride and trichlorosilane
Authors:Katsuhiko Kawasaki  Masakatsu Higo
Institution:Research Centre, Shin Nippon Chisso Hiryo KK., Kanazawa-ku, YokohamaJapan
Abstract:A new sensitive method is proposed for the determination of boron in highpurity silicon tetra chloride and trichlorosilane. The method consists of complexing boron with triphenylchloromethane, removal of excess silicon tetrachloride, hydrolysis of the complex, and improved spectrographic excitation of liberated boric acid.The best sensitivity attainable is 0.03μg B, which corresponds to 0.06 p.p.b. B for a 500-g sample.
Keywords:
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号