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Determination of trace element in a silicon single crystal
Authors:T. Takeuchi  Y. Nakano  T. Fukuda  I. Hirai  A. Osawa  N. Toyokura
Affiliation:(1) Research Reactor Institute, Kyoto University, Kumatori-cho, Sennan-gun, 590-04 Osaka, (Japan);(2) Semiconductor Laboratory, Fujitsu Laboratories Ltd., Wakamiya, 243-01 Morinosato, Atsugi, (Japan)
Abstract:Neutron activation analysis was applied to the determination of trace impurity elements in a silicon ingot. Detection limits of 36 elements were calculated semi — empirically and compared with minimum concentrations detected in a silicon single crystal. The sources of the impurities were estimated from element concentrations detected in polycrystalline silicon and a quartz crucible. Segregation coefficients were determined from the concentration curves in a single crystal and discussed by comparing with reported values.
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