首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Determination of trace element in a silicon single crystal
Authors:T Takeuchi  Y Nakano  T Fukuda  I Hirai  A Osawa  N Toyokura
Institution:(1) Research Reactor Institute, Kyoto University, Kumatori-cho, Sennan-gun, 590-04 Osaka, (Japan);(2) Semiconductor Laboratory, Fujitsu Laboratories Ltd., Wakamiya, 243-01 Morinosato, Atsugi, (Japan)
Abstract:Neutron activation analysis was applied to the determination of trace impurity elements in a silicon ingot. Detection limits of 36 elements were calculated semi — empirically and compared with minimum concentrations detected in a silicon single crystal. The sources of the impurities were estimated from element concentrations detected in polycrystalline silicon and a quartz crucible. Segregation coefficients were determined from the concentration curves in a single crystal and discussed by comparing with reported values.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号