Photoemission studies of a clean and oxidized niobium-aluminum alloy using synchrotron radiation |
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| Authors: | M Oshima BB Pate ZM Lu PJ Jupiter I Lindau WE Spicer |
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| Institution: | Musashino Electrical Communication Laboratory, NTT, Musashino-shi, Tokyo 180, Japan;Stanford Electronics Laboratories, Stanford University, Stanford, CA 94305, U.S.A. |
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| Abstract: | The alloy formation and oxidation of a Nb-rich Nb-Al alloy has been studied using core level photoemission in combination with synchroton radiation as a surface sensitive probe. Exactly the same chemical shifts were observed from both the Nb-Al alloy and an Al-evaporated Nb surface, indicating similar structural arrangements. It is found that the oxidation rate of Nb in these structures is drastically decreased in comparison to either pure Nb metal or Nb3Sn. Two stages in the oxidation of the Nb-Al alloy are clearly distinguished by chemical shifts of the Al2p, Nb4p and O2p levels. |
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