| Quantum simulation for peak broadening in atom lithography |
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| 作者姓名： | 赵敏 王占山 马艳 马彬 李佛生 |
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| 作者单位： | Institute of Precision Optical Engineering Department of Physics，Tongji University，Institute of Precision Optical Engineering，Department of Physics，Tongji University，Institute of Precision Optical Engineering，Department of Physics，Tongji University，Institute of Precision Optical Engineering，Department of Physics，Tongji University，Institute of Precision Optical Engineering，Department of Physics，Tongji University，Shanghai 200092，Shanghai 200092，Shanghai 200092，Shanghai 200092，Shanghai 200092 |
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| 基金项目： | This work was supported by the Nanoscience Foundation of Shanghai under Grant No.0259nm034 and 0452nm029. |
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| 摘 要： | A grating structure with period of half of the laser wavelength generated by focusing Cr atoms with nearly resonant laser standing wave atom lens was simulated using a quantum-mechanical model.The influence of thermal atomic source on atom focusing,including the statistical distribution of the longitudinal veloc- ity and the beam divergence,was discussed.The background and full-width at half-maximum (FWHM) of atomic density peaks with v_z in Maxwell distribution and v_(x0) in Gaussian distribution increase sig- nificantly compared with ideal atoms.Collimating atoms with laser cooling is necessary to decrease the peak broadening.
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