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Effect of backgating on the field distribution in planar thin-film GaAs structures
Authors:Nikolai B Gorev  Inna F Kodzhespirova  Yury A Kovalenko  Evgeny N Privalov  Eugenio F Prokhorov  
Institution:

a Department for Functional Elements of Control Systems, Institute of Technical Mechanics of the National Academy of Sciences of Ukraine, 15 Leshko-Popel St., Dnepropetrovsk 49005, Ukraine

b Laboratorio de Investigacion en Materiales, Centro de Investigacion y de Estudios Avanzados del IPN, Unidad Queretaro, Apardo Postal 1-798, Gral. Arteaga No. 5, Queretaro, 760001 Qro., Mexico

Abstract:The distribution of the electric field in planar film–substrate GaAs structures under backgating is considered. It is shown that backgating can make the film exhibit a long-length region of a low-gradient electric field exceeding the threshold of N-type negative differential mobility, the magnitude of negative differential mobility in this region being high enough. At values of the film doping density and film thickness typical of GaAs transferred-electron devices, this region can be as long as several tens of micrometers. The underlying physical mechanism is discussed.
Keywords:Backgating  GaAs structures  Negative differential mobility
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