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Island growth in submonolayer deposition with aggregation and fragmentation
Authors:M.?Rusanen  author-information"  >  author-information__contact u-icon-before"  >  mailto:Marko.Rusanen@ifp.fr"   title="  Marko.Rusanen@ifp.fr"   itemprop="  email"   data-track="  click"   data-track-action="  Email author"   data-track-label="  "  >Email author,I.?T.?Koponen,J.?Asikainen
Affiliation:(1) Laboratory of Physics, PO Box 1100, 02015 HUT Espoo, Finland;(2) Department of Physical Sciences, University of Helsinki, PO Box 64, 00014, Finland
Abstract:Island growth is studied in the case of island aggregation and break-up during submonolayer deposition. It is demonstrated that the island size distributions are of the scaling form and the mean island size has a power-law behaviour corresponding to hyperthermal deposition conditions. The corresponding scaling exponents are analytically derived and compared with the simulations by the revised particle coalescence method developed here. The scaling exponents are found to depend only on the homogeneity exponents of aggregation and fragmentation kernels.Received: 4 September 2003, Published online: 30 January 2004PACS: 68.55.-a Thin film structure and morphology - 68.35.Fx Diffusion; interface formation - 36.40.Sx Diffusion and dynamics of clustersPresent addressM. Rusanen: Institut Français du Pétrole, Groupe de Modélisation Moléculaire, BP 311, 92852 Rueil-Malmaison, France;Present address J. Asikainen: HRS F27, ETH Zentrum, 8092 Zürich, Switzerland
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