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Preparation and characterization of ZrO2:Sm amorphous thin films by solid state photochemical deposition method
Authors:G Cabello  L Lillo  B Chornik  R del Río
Institution:a Departamento de Ciencias Básicas, Facultad de Ciencias, Universidad del Bío-Bío, Campus Fernando May, Chillán, Chile
b Departamento de Física, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Casilla 487-3, Santiago 8370415, Chile
c Depto Química-Física y Depto de Química Inorgánica, Facultad de Química, Pontificia Universidad Católica de Chile, Casilla 306, Santiago 609441, Chile
d Facultad de Ciencias, Universidad de Valparaíso, Av. Gran Bretaña 1111 Playa Ancha Valparaíso, Chile
Abstract:Thin films of ZrO2 loaded with 10, 30 and 50 mol% Sm were prepared by a photochemical method using thin films of metal acetylacetonate complexes as precursors. The photolysis of these films induces the fragmentation of the acetylacetonate ligand and the partial reduction of metal ion together with volatile organic compounds. When the metallic complex is exposed to air, the product of the reaction is metal oxide. The photoreactivity of these films was monitored by FT-IR spectroscopy, followed by a post-annealing treatment process. The obtained films were characterized by X-ray photoelectron spectroscopy and atomic force microscopy.Photoluminescense studies of the films employed 400 nm radiation for excitation of the Sm ions present. The emission spectra showed signals arising from the 4G5/26HJ (J=3/2, 7/2, 9/2) transitions, where the 4G5/26H3/2 transition has the highest intensity. The concentration dependence of the PL intensity was also studied. A maximum PL intensity was observed with 10 mol% Sm content but then diminished with higher Sm concentrations.
Keywords:A  Amorphous materials  A  Thin films  C  Photoelectron spectroscopy  D  Luminescence
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