The resistive-heating characterization of laser heating system and LaB6 characterization of X-ray diffraction of beamline 12.2.2 at advanced light source |
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Authors: | Jinyuan Yan Jason Knight Selva Vennila Raju Bin Chen Arianna E. Gleason Zack Geballe Simon M. Clark |
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Affiliation: | a Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, USA b Department of Earth & Planetary Science, University of California-Berkeley, CA 94720, USA |
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Abstract: | X-ray diffraction from LaB6 standards document a precision of 478 ppm in lattice-parameter determinations for beamline 12.2.2 at Lawrence Berkeley National Laboratory′s Advanced Light Source, a facility for characterizing materials at high pressures and temperatures using laser- and resistance-heated diamond cells. Melting of Ni, Mo, Pt and W, resistively heated at 1 atm pressure in Ar, provides a validation of the beamline spectroradiometric system that is used to determine sample temperatures. The known melting temperatures, which range from 1665 to 3860 K for these metals, are all reproduced to within ±80 K. |
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